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Voir® Cable-Pod cable solutions are driving the advancement of the semiconductor wafer fabrication and packaging‑testing equipment industries.

Release time:2021-10-14

Semiconductor chip manufacturing demands stringent environmental control, high efficiency, and excellent yield rates. Equipment reliability, precision, and speed are critical factors that drive improvements in production capacity and yield. Addressing challenges such as particulate contamination, ESD protection, equipment uptime, and overall lifecycle costs, Voir® offers durable protective solutions—high‑flexibility, antistatic cables and components—based on a proprietary ePTFE polymer core material.

I. Voir® High-Flexibility Flat Cable

When cables are moved, bent, or rub against heavy cable chains, the microcircuits on semiconductors can become contaminated by particulates, outgassing, and static charge buildup from the cable materials, leading to component damage. In vacuum environments, Voir® high‑flexibility flat cables provide robust, reliable signals for long‑distance, high‑speed data transmission, minimizing dust accumulation and outgassing, thereby boosting production efficiency and reducing maintenance costs.

 

                     

 

Voir® High-Flexibility Flat Cable Structural Diagram

 

                     

Typical semiconductor applications:

Semiconductor packaging and testing, packaging equipment | Semiconductor wafer and chip manufacturing equipment | Lithography equipment | Vacuum environments

II. Voir® Cable-Pod Antistatic Dust-Free Drag Chain

Automated manufacturing places extremely stringent demands on equipment, space, and other factors, requiring drag chain lifespans of over ten million cycles. The Voir® Cable-Pod-ESD black model reduces particle adhesion, prevents the buildup of frictional charges and voltages, enhances signal integrity and production output, and provides light‑blocking properties to minimize glare for CCD cameras used in automated inspection systems.

 

                  

See® Cable-Pod Antistatic Dust-Free Drag Chain Structural Diagram

 

                 

Typical applications: automation, display panels

Semiconductor Automation Equipment | Display Panel Manufacturing | Laser Equipment | Vision Inspection Equipment | Optical Equipment

 

III. Voir® Cable-Pod Low-Dust Collection Drag Chain

Cleanrooms and food‑ and medical‑grade equipment have stringent environmental requirements, necessitating the elimination of static charge buildup and dust adhesion. The Voir® Cable-Pod dust‑free energy chain is crafted from a proprietary e‑PTFE material combined with specialized low‑particulate compounds, offering superior dust‑resistance and antistatic performance to enhance equipment reliability.

 

                           

See the structural diagram of the Voir® Cable-Pod dust-free drag chain.

 

                     

 

Typical applications:

Food & Healthcare | Pharmaceutical Equipment | Cleanrooms | Dust-Free Equipment

 

IV. Voir® Enclosed Cable-Pod

Voir®‑encased Cable‑Pod directly utilizes Voir®’s ePTFE‑based, ESD‑resistant composite film to coat cables, eliminating the need to dismantle cables, air hoses, or energy chains. It adds a dust‑free, antistatic solution without modifying existing systems, offering easy installation and reduced maintenance costs. By applying the coating directly over conventional cable carriers, it enables rapid upgrades that are simple, convenient, and ready for immediate use.

                              

Structural Diagram of High-Rigidity Antistatic Wear-Resistant Composite Material

Typical applications: Rapid and direct upgrade of traditional drag chains

 

V. Voir® Microelectronic Filter Membrane

Semiconductor chips are extremely small, and even the slightest contamination can impair their performance. For manufacturers, eliminating harmful contaminants is critical. Voir is committed to helping semiconductor industry manufacturers by providing high‑cleanliness solutions; Voir® microelectronics filter membranes can streamline manufacturing processes and reduce maintenance costs. Made from polytetrafluoroethylene (PTFE), these materials are chemically inert, withstand extreme temperatures, and offer long‑lasting durability. In addition to the aforementioned cables and cable assemblies, Voir also offers: microfiltration media available in both membrane and pleated formats, which can be easily integrated into a variety of filtration housing systems.

 

                                 

 

Regarding Voir Technology’s dust-free drag chain cables and components:

Voir Technology possesses ePTFE material technology, has been dedicated to ePTFE materials for over a decade, and holds multiple patented technologies. It is a nationally recognized high-tech enterprise and an ePTFE material engineering technology center. To date, Voir Technology’s dust-free drag chain cable and component solutions based on ePTFE materials have been applied in fields such as semiconductor manufacturing and display panel production. Notably, its high-flexibility, antistatic, low-dust cable solution based on ePTFE materials has already begun to be used by leading, well-known domestic semiconductor chip manufacturers.
 

Further Reading: EPTFE: Expanded Polytetrafluoroethylene

The principle behind the formation of ePTFE film is that a linear polymer containing fluorine and carbon atoms, when stretched, transforms into a highly microporous material with a wide range of properties, making it the fluoropolymer with the most outstanding overall performance in industrial applications.

 

                                

 

Voir’s dust-free drag chain CABLE-POD precisely leverages properties 1, 2, 3, 5, 9, and 10 of ePTFE fluoropolymers.

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